It is a type of photolithography that uses 13.5 nm extreme ultraviolet (EUV) light from a laser-pulsed tin (Sn) plasma to create intricate patterns on semiconductor substrates.

EUV lithography is important because it makes scaling more affordable for chipmakers and allows the semiconductor industry to continue its pursuit of Moore’s Law. EUV systems are used to print the …

Nov 28, 2024 · Extreme ultraviolet lithography (EUVL) was recently adopted by the semiconductor industry as the leading-edge lithography technique for continued miniaturization of semiconductor …

EUV stands for "extreme ultraviolet" light. The light visible to humans has wavelengths between 400 and 800 nanometers. The range of ultraviolet light begins below 400 nanometers. The leading lithography …

Jul 13, 2025 · High-NA EUV is the next major advancement in photolithography technology designed to extend the scalability of extreme ultraviolet (EUV) lithography into the sub-2nm process node era.

2 days ago · ASML’s Low Numerical Aperture EUV and High Numerical Aperture (High-NA) EUV products are likely to benefit as ASML holds a near-monopoly in EUV technology crucial for the …

1 day ago · High-NA EUV eliminates these extra steps for critical layers, reducing the number of process stages from approximately 40 down to fewer than 10. This streamlined workflow has allowed Intel to …

EUV lithography represents a departure from earlier photolithography approaches used by the semiconductor industry in several important respects, particularly the light source.

A global leader in the production of at-wavelength extreme ultraviolet (EUV) metrology tools, EUV Tech supplies the semiconductor manufacturing industry with leading-edge metrology solutions using …

Jul 16, 2025 · Extreme Ultraviolet (EUV) lithography represents a significant leap forward in semiconductor manufacturing. By using a 13.5 nm wavelength light source, EUV enables the …