MANHASSET, NY — Sematech and Carl Zeiss announced an agreement to design anddevelop the industry’s first-ever actinic aerial image metrology system fordefect review of EUV photomasks. The AIMS EUV ...
ALBANY, N.Y.--(BUSINESS WIRE)--SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from multi-layer deposition of mask blanks used for ...
Semiconductor Engineering sat down to discuss lithography and photomask issues with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at ...
EUV Tech (EUVT), a global leader in manufacturing at-wavelength EUV metrology equipment, is excited to announce the next generation of EUV zoneplate microscopy. The AIRES ® (Actinic Image REview ...
Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...
Agreement reached to pioneer EUV inspection tool to target mask defects for 22 nm half-pitch node and below. SEMATECH and Carl Zeiss plan to design and develop the industry's first-ever actinic aerial ...
PLAINVIEW, N.Y., Feb. 10, 2022 (GLOBE NEWSWIRE) -- Veeco Instruments Inc. (NASDAQ: VECO) today announced that a mask blank supplier to the semiconductor industry has ordered Veeco’s IBD-LDD® Ion Beam ...
SEOUL, South Korea, Oct. 31, 2022 /PRNewswire/ -- Park Systems, a world-leading manufacturer of Atomic Force Microscopes announced Park NX-Mask, the most effective, safe, and efficient new generation ...
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