ALBANY, N.Y.--(BUSINESS WIRE)--SEMATECH announced today that researchers have reached a significant milestone in reducing tool-generated defects from multi-layer deposition of mask blanks used for ...
EUV Tech (EUVT), a global leader in manufacturing at-wavelength EUV metrology equipment, is excited to announce the next generation of EUV zoneplate microscopy. The AIRES ® (Actinic Image REview ...
ALBANY, New York #151; Researchers have reduced deposition tool-generated defects in mask blanks used for extreme ultraviolet lithography (EUVL), according to Sematech, a consortium of leading chip ...
Semiconductor Engineering sat down to discuss lithography and photomask issues with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at ...
PLAINVIEW, N.Y., Feb. 10, 2022 (GLOBE NEWSWIRE) -- Veeco Instruments Inc. (NASDAQ: VECO) today announced that a mask blank supplier to the semiconductor industry has ordered Veeco’s IBD-LDD® Ion Beam ...
The critical role of EUV pellicles: These thin membranes protect photomasks from contaminants, reducing defect rates and ensuring flawless chip production. The limitations of traditional materials: ...
The chip industry is preparing for the next phase of extreme ultraviolet (EUV) lithography at 3nm and beyond, but the challenges and unknowns continue to pile up. In R&D, vendors are working on an ...
In many ways this could be the year that Extreme Ultra-Violet (EUV) lithography happened at the SPIE conference. Sessions on the subject were packed, both with paper submissions and with attendees. An ...
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