Atomic layer etching (ALE) and atomic layer deposition (ALD) represent pivotal techniques in nanofabrication, enabling control of material removal and growth at the atomic scale. By utilising ...

Researchers from the University of Jyväskylä and Aalto University have developed a new method based on laser modification, ...

Researchers have developed a new method based on laser modification, which allows metal-organic materials to be grown locally ...

Atomic Layer Deposition (ALD) and thin film technologies have become indispensable in modern materials science thanks to their ability to achieve angstrom‐level control over film thickness and ...

Dutch atomic layer deposition (ALD) equipment manufacturer SALD BV has launched a new sheet-to-sheet spatial ALD tool for pilot production of large area perovskite solar devices on glass substrates.

Anna Demming discovers why the vacuum-based technique of atomic-layer deposition – a variant of chemical-vapour deposition – holds so much promise for energy and environmental applications Greener ...

In this interview, discover how ATLANT 3D's DALP technology is revolutionizing thin-film deposition, enabling rapid prototyping and advanced material applications in nanofabrication. Can you please ...

As chips shrink to the nanometer scale, precise control over every fabrication step becomes essential. Atomic layer deposition (ALD) has emerged as a cornerstone of nanoelectronics, enabling the ...

Robin Ras at Aalto University invites applications for a postdoctoral position in thin film deposition for an advanced medical technology that we are planning to commercialize in near future. We are ...

Forge Nano will host its “Advanced ALD x Applications for Photonics” seminar on March 31, 2026 in Hsinchu formally ...

Artificial-intelligence workloads are pushing semiconductor design to a point where traditional scaling strategies are running out of room. Performance improvements that once came from shrinking ...