A pathway for ALD-enhanced materials to be quickly developed and transitioned from lab-scale to commercial production is available for almost any application, for the first time ever. Atomic-level ...
(Nanowerk News) A new way to deposit thin layers of atoms as a coating onto a substrate material at near room temperatures has been invented at The University of Alabama in Huntsville (UAH), a part of ...
BILTHOVEN, THE NETHERLANDS, December 11, 2008 – Further extending its leadership in the critical atomic layer deposition (ALD) market, ASM International N.V. (NASDAQ: ASMI and Euronext Amsterdam: ASM) ...
SAN JOSE, Calif.--(BUSINESS WIRE)--AVACO, specializing in the manufacture of sputtering (PVD) vacuum deposition equipment and atomic layer deposition (ALD) equipment, today announced the development ...
Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...
(Nanowerk News) To make computer chips, technologists around the world rely on atomic layer deposition (ALD), which can create films as fine as one atom thick. Businesses commonly use ALD to make ...
The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...
Atomic layer deposition (ALD) has emerged as a critical technique for fabricating ultrathin films with atomic-scale precision. In particular, ruthenium thin films are of great interest in the ...
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Researchers at UNIST’s Graduate School of Semiconductors Materials and Devices Engineering and Department of Materials Science and Engineering, under the direction of Professor Soo-Hyun Kim, have made ...
A new technical paper titled “Large-area synthesis of high electrical performance MoS 2 by a commercially scalable atomic layer deposition process” by researchers at the University of Southampton, LMU ...
SkyWater Technology announced on September 7 that it will offer customers a new semiconductor processing tool for atomic layer deposition (ALD), the Applied Picosun MorpherTM. Many devices, such as ...
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